ASTM F374-02

Standard Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure (Withdrawn 2003)

STANDARD published on 10.12.2002

English -
PDF - Immediate download (91.00 USD)

English -

Print design (91.00 USD)

The information about the standard:

Designation standards: ASTM F374-02
Note: WITHDRAWN
Publication date standards: 10.12.2002
The number of pages: 17
Approximate weight : 51 g (0.11 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F374-02 :

Keywords:
collinear four-probe array, diffused layer, epitaxial layer, four-point probe method, implanted layer, Ion-implanted layer, probe methods-four-point probe, resistance (electrical)-semiconductors, sheet resistance, silicon semiconductors, sheet resistance-Si-epitaxial/diffused/ion-implanted layers, using, in-line four-point probe, ICS Number Code 29.045 (Semiconducting materials)