Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)
Designation standards: ASTM F388-84
Note: WITHDRAWN
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
ICS Number Code 29.045 (Semiconducting materials)