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ASTM E2246-11
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
STANDARD published on 1.11.2011
The information about the standard:
Designation standards: ASTM E2246-11
Note: WITHDRAWN
Publication date standards: 1.11.2011
SKU: NS-44786
The number of pages: 21
Approximate weight : 63 g (0.14 lbs)
Country: American technical standard
Category: Technical standards ASTM
Annotation of standard text ASTM E2246-11 :
Keywords:
cantilevers, combined standard uncertainty, fixed-fixed beams, interferometry, length measurements, microelectromechanical systems, MEMS, polysilicon, residual strain, round robin, stiction, strain gradient, test structure, Alignment, Calibration--metals/alloys analysis instrumentation, Cantilever testing, Combined standard uncertainty, Fixed-fixed beams, Interferograms/Interferometry, Length, Microelectromechanical systems (MEMS), Noncontacting optical strain measurement systems
Additional information
| Significance and Use | ||||||||||
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Strain gradient values are an aid in the design and fabrication of MEMS devices. |
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| 1. Scope | ||||||||||
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1.1 This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from cantilevers that are touching the underlying layer are not accepted. 1.2 This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory. 1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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| 2. Referenced Documents | ||||||||||
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