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Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)
Designation standards: ASTM F388-84
Note: WITHDRAWN
SKU: NS-55128
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
ICS Number Code 29.045 (Semiconducting materials)
Latest update: 2024-07-18 (Number of items: 2 337 971)
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