ASTM F996-98

Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift Into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics



STANDARD published on 10.5.1998


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The information about the standard:

Designation standards: ASTM F996-98
Note: WITHDRAWN
Publication date standards: 10.5.1998
SKU: NS-57212
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F996-98 :

Keywords:

Current measurement-semiconductors, Electrical conductors-semiconductors, Gate and field oxides, Ionizing radiation, MOSFETs, Radiation exposure-electronic components/devices, Silicon-semiconductor applications, Threshold voltage, separating a total-dose induced mosfet threshold voltage shift into, ICS Number Code 31.080.30 (Transistors)

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