Standard IEC 62047-6-ed.1.0 7.4.2009 preview

IEC 62047-6-ed.1.0

Semiconductor devices - Micro-electromechanical devices - Part 6: Axial fatigue testing methods of thin film materials



STANDARD published on 7.4.2009


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The information about the standard:

Designation standards: IEC 62047-6-ed.1.0
Publication date standards: 7.4.2009
SKU: NS-414113
The number of pages: 30
Approximate weight : 90 g (0.20 lbs)
Country: International technical standard
Category: Technical standards IEC

The category - similar standards:

Other semiconductor devices

Annotation of standard text IEC 62047-6-ed.1.0 :

IEC 62047-6:2009 specifies the method for axial tensile-tensile force fatigue testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 µm and 10 µm under constant force range or constant displacement range. Thin films are used as main structural materials for MEMS and micromachines. The main structural materials for MEMS, micromachines, etc., have special features, such as typical dimensions of a few microns, material fabrication by deposition, andtest piece fabrication by means of non-mechanical machining, including photolithography. This International Standard specifies the axial force fatigue testing methods for micro-sized smooth specimens, which enables a guarantee of accuracy corresponding to the special features. The tests are carried out at room temperatures, in air, with loading applied to the test piece along the longitudinal axis. La CEI 62047-6:2009 specifie la methode relative a lessai de fatigue pour une force axiale de traction-traction des materiaux en couche mince de longueur et largeur inferieures a 1 mm et dune epaisseur comprise entre 0,1 µm et 10 µm dans le cadre dune gamme de force constante ou dune gamme de deplacement constant. Les couches minces sont utilisees comme materiaux de construction principaux pour les systemes micro-electromecaniques (MEMS, Micro-Electromechanical Systems) et les micromachines. Les materiaux de construction principaux pour les MEMS, les micromachines, etc. comportent des caracteristiques speciales telles que des dimensions typiques de lordre de quelques microns, une fabrication de materiau par depot, et une fabrication deprouvettes dessai au moyen dun usinage non mecanique, qui peut etre la photolithographie. La presente Norme internationale specifie les methodes dessais de fatigue pour force axiale pour des eprouvettes lisses microminiaturisees, qui garantissent une precision correspondant aux caracteristiques speciales. Les essais sont effectues a temperatures ambiantes, a lair, en appliquant la charge a leprouvette le long de laxe longitudinal.

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