We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.
Semiconductor devices - Non-destructive recognition criteria of defects in silicon carbide homoepitaxial wafer for power devices - Part 1: Classification of defects
Translate name
STANDARD published on 30.1.2019
Designation standards: IEC 63068-1-ed.1.0
Publication date standards: 30.1.2019
SKU: NS-935986
The number of pages: 23
Approximate weight : 69 g (0.15 lbs)
Country: International technical standard
Category: Technical standards IEC
IEC 63068-1:2019(E) gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images.
Do you want to make sure you use only the valid technical standards?
We can offer you a solution which will provide you a monthly overview concerning the updating of standards which you use.
Would you like to know more? Look at this page.
Latest update: 2024-12-21 (Number of items: 2 216 840)
© Copyright 2024 NORMSERVIS s.r.o.