We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.
Semiconductor devices - Classification of defects in gallium nitride epitaxial film on silicon carbide substrate
Translate name
STANDARD published on 7.4.2021
Designation standards: IEC 63229-ed.1.0
Publication date standards: 7.4.2021
SKU: NS-1022112
The number of pages: 21
Approximate weight : 63 g (0.14 lbs)
Country: International technical standard
Category: Technical standards IEC
IEC 63229:2021(E) gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission electron microscope images for these defects. This document covers only defects in as-grown GaN epitaxial film on SiC substrate and does not include defects caused by subsequent processes.
Do you want to be sure about the validity of used regulations?
We offer you a solution so that you could use valid and updated legislative regulations.
Would you like to get more information? Look at this page.
Latest update: 2025-04-21 (Number of items: 2 197 286)
© Copyright 2025 NORMSERVIS s.r.o.