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ASTM E1438-91(1996)
Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
STANDARD published on 15.9.1991
The information about the standard:
Designation standards: ASTM E1438-91(1996)
Note: WITHDRAWN
Publication date standards: 15.9.1991
SKU: NS-41753
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
Annotation of standard text ASTM E1438-91(1996) :
Keywords:
data analysis-spectrochemical, depth resolution, interface width, profile distortion, secondary ion mass spectrometry (SIMS)
Additional information
| 1. Scope | ||
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1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens. 1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution. 1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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| 2. Referenced Documents | ||
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