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ASTM E2444-11(2018)
Standard Terminology Relating to Measurements Taken on Thin, Reflecting Films
Translate name
STANDARD published on 1.5.2018
The information about the standard:
Designation standards: ASTM E2444-11(2018)
Publication date standards: 1.5.2018
SKU: NS-848389
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
The category - similar standards:
Electronics (Vocabularies)Mechanical structures for electronic equipment
Annotation of standard text ASTM E2444-11(2018) :
Keywords:
cantilevers, definitions, fixed-fixed beams, interferometry, length measurements, microelectromechanical systems, MEMS, polysilicon, residual strain, stiction, strain gradient, terminology, test structure,, ICS Number Code 01.040.31 (Electronics (Vocabularies)), 31.240 (Mechanical structures for electronic equipment)
Additional information
| 1. Scope | ||||||||
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1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section 2, which were generated by Committee E08 on Fatigue and Fracture. Terminology E1823 Relating to Fatigue and Fracture Testing is applicable to this standard. 1.2 The terms are listed in alphabetical order. 1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. |
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| 2. Referenced Documents | ||||||||
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